Event
- Event ID
- 41
- Quality
- Description
- The incident occurred when cleaning the exhaust gas-processing equipment at a semiconductor factory.
The inside of the water scrubber was washed with hydrofluoric acid. This is a normal operation aiming at cleaning the internal surfaces from the material deposited during operation. This material consists usually in silicon oxide. However, in the case of the incident, it consisted of an external layer of oxide, covering metallic silicon. After the surface silicone oxide dissolves, the silicon and hydrogen fluoride react, generating hydrogen. The above became clear after the accident. Therefore, a backflow of air during the drainage of the cleaning fluid formed a combustible a hydrogen-air mixture, which ignited and exploded.
The water scrubber was damaged by the explosion. Two persons were exposed to the solution which was scattered and were slightly injured. - Event Initiating system
- Classification of the physical effects
- Hydrogen Release and Ignition
- Nature of the consequences
- Macro-region
- Asia
- Country
- Japan
- Date
- Main component involved?
- Process Gas Treatment
- How was it involved?
- Internal Explosion (H2-Air Mixture)
- Initiating cause
- Accidental Hydrogen Formation
- Root causes
- Root CAUSE analysis
- The INITIATING/direct cause was the accidental formation of hydrogen from an unexpected reaction.
The ignition source was probably an exothermal and explosive decomposition of compounds.
Contributing causes were:
(i) The operation management did not understand the process ongoing in the scrubber, and did not consider the possibility of unwanted reaction
(ii) Poor discipline and enforcement of procedure. The investigation revealed that the operators were supposed to put on protective gear before work, but they did not do so because they did not handle hydrofluoric acid directly. Although a operational standard was prepared, a manager who was not a chemical specialist changed the procedure.
Facility
- Application
- Electronics And Micro-Electronics
- Sub-application
- semiconductors factory
- Hydrogen supply chain stage
- All components affected
- scrubber
- Location type
- Confined
- Location description
- Industrial Area
- Operational condition
- Pre-event occurrences
- The usual procedure for the cleaning of the scrubber was to wash it with hydrofluoric acid. This is a normal operation aiming at cleaning the internal surfaces from the material deposited during operation, which normally consists in silicon oxide.
Emergency & Consequences
- Number of injured persons
- 1
- Number of fatalities
- 0
- Environmental damage
- 0
- Property loss (offsite)
- 0
- Post-event summary
- Two persons were exposed to the acid solution which was scattered around the place by the explosion and were slightly injured.
The water scrubber was damaged by the explosion. - Emergency action
- Local fire department and emergency medical technicians also quickly responded to the incident and assisted with emergency response and evacuation actions.
The main activity has been to keep cool the hydrogen delivery truck and the surrounding area after the explosion.
Lesson Learnt
- Corrective Measures
Changing the structure to prevent a reverse flow of air.
Installing a flow meter and conducting enough purging with nitrogen.
Not allowing operators to change operation standards by their own judgment.
Always wearing the prescribed protective gear.
Event Nature
- Release type
- gas
- Involved substances (% vol)
- H2 100%
- Presumed ignition source
- Run-away reaction
References
- Reference & weblink
JST failures database:<br />
https://www.shippai.org/fkd/en/cfen/CC1200095.html<br />
(accessed Dec 2023)
JRC assessment
- Sources categories
- JST